Optical Measurement Systems
This course provides a foundational understanding of the optical measurement systems critical to semiconductor manufacturing. Students will delve into the core components of these systems, including various light sources, lamps, and their characteristics, as well as the operation of spectrometers and detectors. The curriculum covers the essential principles of optics, objectives, and apertures, focusing on their role in precise measurement. Key optical metrology techniques such as reflectometry, spectroscopic ellipsometry, and scatterometry will be explored, with an emphasis on optical critical dimension (CD) modeling. Students will learn to interpret complex spectral data, assess signal quality, identify sources of noise, and understand proper system alignment procedures, preparing them for hands-on work with vendor-neutral metrology platforms.
Course outline
Lectures, virtual labs, and graded assignments — completed in your browser.
Syllabus
### MET 105 — Optical Measurement Systems (3 credits) **Course Description:** This course provides a comprehensive introduction to the principles and applications of optical measurement systems essential for semiconductor manufacturing. Students will explore the fundamental components of metrology tools, including light sources, detectors, and optical elements, and learn the theory behind advanced techniques like reflectometry, spectroscopic ellipsometry, and scatterometry. The curriculum emphasizes practical skills such as spectra interpretation, signal quality analysis, noise mitigation, and system alignment, preparing students for roles as semiconductor optical metrology tool technicians. This vendor-neutral course uses industry-standard integrated and standalone thin-film and optical CD metrology platforms as reference. **Learning Outcomes:** Upon successful completion of this course, students will be able to: 1. Identify and describe the function of various light sources, lamps, spectrometers, detectors, and optical components within metrology systems. 2. Explain the fundamental principles and applications of reflectometry, spectroscopic ellipsometry, and scatterometry for thin-film and critical dimension measurements. 3. Interpret spectral data and understand the basics of optical critical dimension (CD) modeling results from optical metrology tools. 4. Analyze signal quality, identify common sources of noise, and describe methods for noise reduction and proper system alignment. 5. Apply theoretical knowledge to troubleshoot basic issues and perform routine checks on optical measurement systems. **Grading Weights:** * Knowledge Checks: 15% * Assignments: 30% * Quizzes: 25% * Final Exam: 30% **Policies:** * **Attendance:** Regular attendance is expected. Students are responsible for all material covered in class, regardless of attendance. * **Late Submissions:** Assignments submitted after the due date may incur a penalty, typically 10% per day late, unless prior arrangements are made with the instructor due to extenuating circumstances. * **Academic Integrity:** All work submitted must be original. Plagiarism or cheating will result in a zero for the assignment and may lead to further disciplinary action as outlined in the college's academic honesty policy. * **Disability Services:** Students requiring accommodations due to a disability should contact the Disability Services office and provide the instructor with an official accommodation letter. * **Safety:** Laboratory safety protocols must be strictly followed at all times. Failure to adhere to safety guidelines will result in removal from the lab session and a potential grade penalty.