Advanced Lithography and EUV Systems

This course delves into the advanced techniques and challenges of optical lithography, including immersion, DUV, and multi-patterning. A significant portion focuses on Extreme Ultraviolet (EUV) lithography, exploring its sources, optics, masks, and resist technologies. Students will also investigate metrology, defect control, and process integration for high-volume manufacturing of integrated circuits. The course aims to equip students with a deep understanding of current and future lithography solutions.

Course outline

Lectures, virtual labs, and graded assignments — completed in your browser.

01Introduction to Lithography and Optical Fundamentalslecture

02Advanced Optical Lithography: Immersion and DUV Systemslecture

03Resolution Enhancement Techniques (RET): OPC, PSM, SMOlecture

04Multi-Patterning Technologies: LELE, SADP, SAQPlecture

05Lithography Metrology and Overlay Controllecture

06Photoresist Chemistry and Processing for Advanced Nodeslecture

07Extreme Ultraviolet (EUV) Lithography Introductionlecture

08EUV Sources and Source-to-Wafer Efficiencylecture

09EUV Optics: Reflective Multilayers and Aberrationslecture

10EUV Mask Technology and Defectivity Managementlecture

11EUV Resist Performance and Sensitivity Challengeslecture

12Patterning Control and Process Integration for EUVlecture

13Alternative Lithography Techniques: Nanoimprint and Directed Self-Assemblylecture

14Future Trends, High-NA EUV, and Economic Considerationslecture

Syllabus

Each week will feature recorded lectures, assigned readings from textbooks and journal articles, and practical problem sets or simulations. Active participation in online discussion forums, facilitated by the instructor, is expected for exploring complex topics and sharing insights. Quizzes will be administered regularly to assess understanding of core concepts. A mid-term exam will cover the first half of the course material, while a final project, involving a case study or design proposal related to advanced lithography, will be due at the end of the semester. Late submissions for assignments will incur a penalty unless prior arrangements are made with the instructor. Academic integrity is paramount; all submitted work must be original. Expect to dedicate approximately 9-12 hours per week to course activities, including lectures, readings, and assignments.