Semiconductor Manufacturing Processes I: Deposition

Students in this course gain a comprehensive understanding of various thin-film deposition methods essential for semiconductor manufacturing. They will explore the physics and chemistry behind techniques such as physical vapor deposition (PVD), chemical vapor deposition (CVD), and atomic layer deposition (ALD), including their process parameters, equipment, and material properties. Practical knowledge of film characterization and quality control, along with safety protocols relevant to deposition processes, is emphasized. Upon completion, students will be able to identify appropriate deposition techniques for specific device layers, troubleshoot common process issues, and contribute effectively to semiconductor cleanroom operations.

Prerequisites

SET 110

Course outline

Lectures, virtual labs, and graded assignments — completed in your browser.

01Thin Film Deposition: An Introduction to Semiconductor Fabricationlecture

02Vacuum Systems and Controlled Environments for Depositionlecture

03Sputtering Fundamentals: From Plasma Generation to Film Growthlecture

04Advanced Sputtering Systems and Metallization Applicationslecture

05Evaporation Deposition: Thermal and E-Beam Methodslecture

06Thermal CVD: Surface Reactions and Film Formationlecture

07Plasma-Enhanced CVD: Enhancing Film Quality and Lowering Temperatureslecture

08High-Density Plasma CVD for Gap-Fill and Planarizationlecture

09Atmospheric and Low-Pressure CVD for Various Film Applicationslecture

10Atomic Layer Deposition: Precision and Conformal Film Growthlecture

11Measuring Film Thickness, Uniformity, and Compositionlecture

12Safety and Environmental Compliance in Deposition Manufacturinglecture

13Integrating Deposition Steps for Device Performancelecture

14Innovations in Thin Film Deposition for Advanced Semiconductorslecture

Syllabus

Week 1: Introduction to Thin Films and Deposition Processes
Week 2: Vacuum Technology for Deposition
Week 3: Physical Vapor Deposition (PVD) Overview
Week 4: Evaporation Techniques
Week 5: Sputtering Fundamentals and Systems
Week 6: Chemical Vapor Deposition (CVD) Principles
Week 7: Atmospheric Pressure CVD and Low Pressure CVD
Week 8: Plasma-Enhanced CVD (PECVD) and High-Density Plasma CVD (HDPCVD)
Week 9: Epitaxial Growth Techniques
Week 10: Atomic Layer Deposition (ALD)
Week 11: Spin Coating and Solution-Based Deposition
Week 12: Film Characterization Techniques
Week 13: Deposition Process Control and Troubleshooting
Week 14: Safety and Environmental Considerations in Deposition