Photolithography

Students will delve into the fundamental science and engineering behind photolithography, mastering the steps involved in pattern transfer for integrated circuit fabrication. Topics include light sources, photoresists, exposure tools, and etching techniques. Through theoretical study and virtual lab simulations, learners will understand how to select appropriate lithographic processes, troubleshoot common issues, and contribute effectively to semiconductor device manufacturing. This course equips students with essential skills for roles in process development, equipment operation, and quality control within the microfabrication industry.

Prerequisites

SET 201

Course outline

Lectures, virtual labs, and graded assignments — completed in your browser.

01The Lithography Imperative: Device Patterning Fundamentalslecture

02Light Fantastic: Optical Foundations for Imaginglecture

03Resist Revolution: Polymers of Precisionlecture

04Cleanliness is Key: Surface Science for Coatinglecture

05Shadows and Transfers: Contact and Proximitylecture

06Stepping Up: Projection Systems and Imaginglecture

07The Master Plan: Reticle Design and Productionlecture

08Developing the Image: From Latent to Relieflecture

09Pattern Transfer: Etch and Strip Strategieslecture

10Measuring Perfection: Critical Dimension Controllecture

11Flaws in the Fabric: Defectivity and Yieldlecture

12Beyond the Wavelength: Immersion and Extreme UVlecture

13Alternative Approaches: Non-Optical Patterninglecture

14Shrinking Horizons: The Future of Lithographylecture

Syllabus

Week 1: Introduction to Semiconductor Manufacturing and Photolithography
Week 2: Fundamental Principles of Light and Optics
Week 3: Photoresist Chemistry and Characteristics
Week 4: Substrate Preparation and Photoresist Coating
Week 5: Exposure Systems: Steppers and Scanners
Week 6: Mask Design and Reticle Technology
Week 7: Pattern Transfer and Image Formation
Week 8: Post-Exposure Bake and Development Processes
Week 9: Critical Dimension (CD) Control and Metrology
Week 10: Etching Techniques: Wet and Dry Etching
Week 11: Defect Inspection and Yield Enhancement
Week 12: Advanced Photolithography Techniques: Immersion and EUV
Week 13: Lithography Process Integration and Troubleshooting
Week 14: Future Trends in Photolithography and Nanofabrication