Tool Calibration, Matching and Quality Control
This foundational course, MET 110, equips future Semiconductor Optical Metrology Tool Technicians with critical skills in ensuring the accuracy and consistency of sophisticated metrology equipment. Students will delve into practical methodologies for tool calibration, including the proper use of reference wafers and standards, and effective recipe setup for diverse measurement targets. A significant emphasis is placed on understanding and implementing Gauge Repeatability and Reproducibility (GR&R) studies to quantify measurement system variation. The curriculum covers strategies for achieving and maintaining precision and accuracy across multiple tools and chambers, employing statistical process control (SPC) charts for proactive drift detection, and managing comprehensive requalification and calibration records. This vendor-neutral training provides a robust understanding applicable to a wide range of optical metrology platforms.
Prerequisites
Course outline
Lectures, virtual labs, and graded assignments — completed in your browser.
Syllabus
**Course: MET 110 — Tool Calibration, Matching and Quality Control (3 credits)** **Course Description:** This course provides comprehensive training in the principles and practices of tool calibration, matching, and quality control for semiconductor optical metrology equipment. Students will learn to establish and maintain measurement system integrity through the proper use of reference standards, recipe optimization, Gauge Repeatability and Reproducibility (GR&R) studies, and statistical process control (SPC) techniques. Key topics include understanding precision and accuracy, implementing tool-to-tool and chamber matching procedures, detecting drift, and maintaining meticulous calibration records essential for high-volume manufacturing environments. **Learning Outcomes:** Upon successful completion of this course, students will be able to: 1. Utilize reference wafers and standards to perform initial tool setup and baseline calibration. 2. Design and implement effective measurement recipes and targets for various metrology applications. 3. Conduct Gauge Repeatability and Reproducibility (GR&R) studies to assess measurement system variation and ensure data reliability. 4. Apply tool-to-tool and chamber matching techniques, along with SPC charts, to monitor equipment performance, detect drift, and maintain process control. 5. Document and manage calibration, requalification, and maintenance records according to industry best practices. **Grading Weights:** * Knowledge Checks: 15% * Assignments: 30% * Quizzes: 25% * Final Exam: 30% **Policies:** * **Attendance:** Regular attendance is expected and strongly encouraged. Missed lectures are the student's responsibility to catch up on. * **Late Submissions:** Assignments submitted late may incur a penalty unless prior arrangements have been made with the instructor due to extenuating circumstances. * **Academic Integrity:** All work submitted must be original. Plagiarism or any form of academic dishonesty will not be tolerated and will result in serious consequences as outlined in the college's academic integrity policy. * **Safety:** Laboratory safety protocols must be strictly followed at all times. Failure to comply may result in removal from the lab session and a failing grade for the activity.